Structure formation in atom lithography using geometric collimation
نویسندگان
چکیده
منابع مشابه
Atom lithography with metastable helium
A bright metastable helium He beam is collimated sequentially with the bichromatic force and three optical molasses velocity compression stages. Each He atom in the beam has 20 eV of internal energy that can destroy a molecular resist assembled on a gold coated silicon wafer. Patterns in the resist are imprinted onto the gold layer with a standard selective etch. Patterning of the wafer with th...
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ژورنال
عنوان ژورنال: Applied Physics B
سال: 2011
ISSN: 0946-2171,1432-0649
DOI: 10.1007/s00340-011-4743-5